Application areas
Semiconductor
PVDF material is highly compatible with wafer‑cleaning equipment and offers significant overall performance advantages. It exhibits excellent corrosion resistance, withstanding a wide range of process‑level acids, organic solvents, and other cleaning agents; prolonged use does not lead to media‑induced degradation, ensuring consistent cleaning quality and extending equipment service life. Its superior thermal stability allows it to accommodate diverse temperature conditions in the cleaning process, with neither its structure nor properties compromised under high‑temperature heating. Additionally, it boasts strong mechanical strength, resisting cracking or damage under normal operating loads. Coupled with its excellent machinability, PVDF can be tailored into custom‑shaped components of various specifications to meet the precise assembly requirements of wafer‑cleaning systems.
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Manager Zhu (International Business Department)
Manager Yu (Sales Department II)
Manager Ni (Sales Department III)
Manager Ma (Complaints and Suggestions Department)
Phase I Address: No. 18 Fuyuan Road, Luotang Subdistrict, Jiangyan District, Taizhou City, Jiangsu Province
Phase II Address: No. 888, Xingfu Road, Luotang Subdistrict, Jiangyan District, Taizhou City, Jiangsu Province
Kunshan Address: Room 1916 & 1917, Building 21, Yoshida International Plaza, No. 672 Chuangye Road, Kunshan Economic and Technological Development Zone, Kunshan City
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